2017 BACUS Prize in Monterey, Kalifornien, USA
Elmar Platzgummer and Hans Loeschner (IMS Nanofabrication) accepted the 2017 BACUS Prize from Frank Abboud (Intel Corp.) “in recognition of their contribution to the photomask industry through their work and influence to develop and commercialize high keV Multi-Beam photomask lithography tools”.
