News
IMS presents at Photomask Japan | PMJ´18, 18.-20. April 2018, Yokohama/JP
IMS presents at SPIE Advanced Lithography | 25. Feb. – 1. Mar. 2018, San Jose/CA
IMS presents at SPIE Photomask Technology | BACUS´17, 11-14 Sept. 2017, Monterey/CA
IMS and JEOL partner to provide world’s 1st production Multi-Beam Mask Writer
VIENNA–(BUSINESS WIRE)–IMS Nanofabrication AG (“IMS”) and JEOL Ltd. (“JEOL”) announced today they have reached a long term agreement to extend their business partnership for the production of the IMS MBMW-101, the world’s first commercial high volume manufacturing Multi-Beam Mask Writer (MBMW). IMS manufactures a multi-beam write engine providing 262-thousand programmable beams of 50keV energy. JEOL provides a novel platform with an air-bearing vacuum stage for writing most advanced patterns on 6-inch mask blanks. Together, IMS and JEOL will supply the MBMW-101 to the industry’s leading edge photomask manufacturers.
Executive Interview of Elmar Platzgummer by Mark LaPedus at BACUS´16
Invited presentation of Elmar Platzgummer / CEO at SEMICON Taiwan
Advanced Technologies in Accelerating Digital Era and IoT Forum, Electron Multi-Beam Technology for Mask and Wafer Direct Write