The IMS Nanofabrication platform technology comprises a broad range of advanced know how and expertise based on charged particle technology. IMS focuses on development and manufacturing of tools for nanolithography and nanopatterning of surfaces. The aim is to extend resolution and throughput limits of today's conventional systems by a combination of existing technologies to create integrated systems with improved performance.

The IMS Nanofabrication Technology includes the following competence areas:

• User needs and methods for nanolithography and resist-less nanopatterning
• Charged particle beam technology and systems
• Process know how and process simulation software tools

IMS Nanofabrication is currently active in the areas of electron beam maskless nanolithography and ion beam maskless and resistless nanopatterning of materials and surfaces. The following development programs have been launched in cooperation with international partners:

• eMET: electron Mask Exposure Tool - with 50 keV electron multi-beams

• PML2: Projection Mask-Less Lithography - with 50 keV electron multi-beams

• CHARPAN: Charged Particle Nanopatterning - with 10-20 keV ion multi-beams

IMS Nanofabrication has extensive experience in system design of advanced charged particle tools, optics modeling and integration of prototypes. IMS specifies and co-develops electronic and micro-system-technology modules with specialist subcontractors in these fields.

By using electrons or ion multi beams for lithography and direct structuring, the advantages of charged particles are effectively used. Previous projects have proven the charged particle technology and have shown important results in ion beam lithography and resist-less patterning down to 12.5nm resolution. IMS Nanofabrication has established a broad portfolio of enabling patents.

Copyright by IMS Nanofabrication AG, Vienna, Austria, Last update: 27 April 2010

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