Publications

Invited Paper: MBMW-101: World’s 1st High-Throughput Multi-Beam Mask Writer

Photomask Technology 2016
Vol. 9985, 998505 · © 2016 SPIE · CCC code: 0277-786X/16/$18 · doi: 10.1117/12.2243638

Christof Klein and Elmar Platzgummer


Investigation of local registration performance of IMS Nanofabrication’s Multi-Beam Mask Writer

Photomask Japan 2015, Photomask and Next-Generation Lithography Mask Technology XXII
Proc. of SPIE Vol. 9658, 965805 · © 2015 SPIE CCC code: 0277-786X/15/$18 · doi: 10.1117/12.2196388

Daniel Chalom 1, Jan Klikovits 1, David Geist 1, Peter Hudek 1, Stefan Eder-Kapl 1,
Mehdi Daneshpanah 3, Frank Laske 2, Stefan Eyring 2, Klaus-Dieter Roeth 2
1 IMS Nanofabrication AG, Vienna and Brunn am Gebirge, Austria
2 KLA-Tencor GmbH, Weilburg, Germany
3 KLA-Tencor Inc., Milpitas, California, USA


Invited Paper: Performance of the Proof-of-Concept Multi-Beam Mask Writer (MBMW POC)

SPIE Photomask Technology BACUS 2013
Vol-8880 · © 2013 SPIE · CCC code: 0277-786X/16/$18 · doi: 10.1117/12.2243638

Christof Klein, Hans Loeschner, and Elmar Platzgummer


Electron multibeam technology for mask and wafer writing at 0.1 nm address grid

Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3), 031108, Jul-Sep 2013, Vol. 12(3)

Elmar Platzgummer, Christof Klein, and Hans Loeschner