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IMS Nanofabrication is a well recognized partner in the semiconductor and nanotech industry for the development of novel nanolithography and nanopatterning tools and has built up a broad experience and technology base in the fields of charged particle proof-of-concept system realization as well as charged particle optics and process simulation programs.
We offer both consulting and development services to support your product or process development and help finding advanced and reliable solutions.
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IonShaper® - 2D/3D simulation program
IonShaper® is a software tool which allows precision simulation of ion beam processing of various materials micro and nano devices.
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Electron and Ion Optics calculations and system design
IMS Nanofabrication is an expert in electron and ion optics design. Based on your needs we are happy to provide our professional expertise in all stages of the optics design process: from solutions for specific design problems to the development of complete optical systems.
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eMET - electron Mask Exposure Tool
IMS Nanofabrication is developing the electron-optical column of a Mask Exposure Tool (eMET) for the fabrication of Leading-Edge Complex Masks. eMET promises to fulfill the requirements of the 16nm hp mask technology node and below. eMET will provide decisive advantages by using ca. 256 thousand electron multi-beams of 50 keV energy, working in parallel on a 6" mask blank.
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CHARPAN Nanopatterning Tool
IMS Nanofabrication developed in 2009 the CHARPAN Tool providing ca. 43,000 programmable ion beams of 12.5 nm beam size. The CHARPAN Nanopatterning Tool will be equipped with a laser-interferometer controlled vacuum stage. Using different ion species like H+, He+, Ar+ and Xe+ the CHARPAN Nanopatterning Tool will be ideally suited for 2D and 3D nanopatterning of materials and surfaces for industry oriented nanotechnology applications.
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