Latest News & Publications
This section contains latest corporate news.
Please contact Hans Loeschner (
) for further information.
Oral presentation at BACUS2010 - SPIE Photomask Technology
Conference information: http://spie.org/x6323.xml
Presentation of Elmar Platzgummer:
“eMET - 50 keV electron Mask Exposure Tool development based on proven multi-beam
projection technology”
Oral presentation at PMJ2010 - SPIE Photomask Japan
Conference information: www.photomask-japan.org
Presentation of Hans Loeschner:
“eMET: Development of a 50 keV electron projection multi-beam
Mask Exposure Tool for the
16nm hp Technology Node and below”
Keynote and oral talks at SPIE Advanced Lithography 2010 – Alternative Lithographic Technologies, San Jose, California, USA
Conference information: http://spie.org/
Keynote of Elmar Platzgummer:
“Maskless Lithography and Nanopatterning with Electron and Ion Multi-Beam Projection”
Presentation of Christof Klein:
“50 keV electron beam projection maskless lithography (PML2): results obtained with 2,500 programmable 12.5nm sized beams”
Invited and oral talks at EMLC 2010 – The 26th European Mask and Lithography Conference, Grenoble, France
Conference information: www.EMLC2010.com
Presentation of Christof Klein:
“Projection Mask-Less Lithography and Nanopatterning with Electron and Ion Multi-Beams”
Invited talk of Falco van Delft / Philips Research MiPlaza, Einhoven, Netherlands, IMS Nanofabrication co-authors Hans Loeschner and Elmar Platzgummer:
“Masters for Substrate Conformal Imprint Lithography (SCIL) generated by Charged Particle Nanopatterning (CHARPAN) Techniques”
Invited talk at MNC09 – 2009 International Microprocesses and Nanotechnology Conference, Sapporo, Japan
Conference information: http://www.imnc.jp/
Paper to be published in Jap. J. Appl. Phys.: http://jjap.ipap.jp/
Invited talk of Hans Loeschner:
“Projection Charged Particle Nanolithography and Nanopatterning”
CHARPAN Tool fabricated 12.5nm hp dots and lines in 20nm HSQ on Si:
Discussion of the throughput potential of Multi-Axis-PML2 tool configurations:
(format and data points for Gaussian Beam, Shaped Beam and ML2 apart from Multi-Axis-PML2: Hans C Pfeiffer, plenary talk at MNE 2009, Ghent, Sept 29, 2009)
Presentations at MNE 2009, Ghent, Belgium
Conference Info: http://www.mne09.org/
MNE 2009 proceedings: http://www.elsevier.com http://www.sciencedirect.com
Presentation of Christof Klein:
“PML2 – Projection Mask-Less Lithography”
2500 programmable 12.5nm multibeams @ 50keV in 50nm HSQ
Presentation of Falco van Delft / Philips Research MiPlaza, Eindhoven, Netherlands, with IMS Nanofabrication co-authors Hans Loeschner and Elmar Platzgummer:
“Charged Particle Nanopatterning (CHARPAN) of 2D and 3D masters for flexible replication in Substrate Conformal Imprint Lithography (SCIL)”
Presentation at SPIE Photomask BACUS 2009, Monterey, California, USA
Conference and proceedings information: http://spie.org/
SPIE Photomask BACUS 2009 Best Presentation / 3rd Award :
http://spie.org/Documents/Membership/BacusNewsletters/BACUS-Newsletter-February-2010.pdf
Presentation of Elmar Platzgummer:
“Charged particle multibeam lithography evaluations for sub-16-nm hp mask node fabrication”
Poster presentation of Florian Letzkus / Institute for Microelectronics Stuttgart, IMS Nanofabrication co-authors: Christof Klein, Hans Loeschner and Elmar Platzgummer:
“3D Si Aperture-Plates combined with programmable Blanking-Plates for Multi-Beam Mask Writing”
The 2009 Lithography Workshop, Coeur d’Alene, Idaho, USA
Conference information and presentations: http://www.lithoworkshop.org
Invited talk of Laurent Pain / CEA-Leti, on behalf of Christof Klein:
“PML2 – Projection Mask-Less Lithography: The High Energy ML2 Solution within MAGIC”
to 29
EIPBN 2009 – The 53rd International Conference on Electron, Ion and Photo Beam Technology & Nanofabrication, Marco Island, Florida, USA
Conference information: www.eipbn.org
Proceedings: http://scitation.aip.org/jvstb/
Invited talk of Hans Loeschner, on behalf of Elmar Platzgummer:
“Charged Particle Nanopatterning (CHARPAN)”
Invited talk of Mathias Irmscher / Institute for Microelectronics Stuttgart, on behalf of Christof Klein:
“Programmable Aperture Plate System with integrated CMOS electronics for projection maskless nanolithography and nanopatterning”
Talk of Christoph Ebm:
“ Ion Multi-Beam Nanopatterning for Photonic Applications: Experiments and Simulations, Including Study of Precursor Gas iInduced Etching and Deposition”
Talk of Hans Loeschner, on behalf of Gang Chen / Johannes Kepler University Linz:
“Positioning of Nanocrystals on Prestructured Substrates”
Copyright by IMS Nanofabrication AG, Vienna, Austria, Last update: 27 April 2010