A leading technology provider for the nanoworld
IMS Nanofabrication AG is an Austrian based high-tech company and acts as technology innovator and provider for the nanoworld industries. Based on our extensive know how in charged particle systems we offer solutions to directly transfer custom design patterns to resist or to generate resist-less two and three dimensional surface modifications with features below 20 nanometers.
The IMS Nanofabrication AG was formed in Dec 2006 from the prior company IMS Nanofabrication GmbH.
IMS Nanofabrication focuses its efforts on development and production of key tool components and plans to commercialize its technology and related services in cooperation with strategic partners.
Managment Team
Max Bayerl, CEO
Max Bayerl was appointed Chief Executive Officer of IMS Nanofabrication AG in May 2009. He held this position already before, from late 1990 to mid 2003.
Bayerl has gained extensive technology and general management experience through various positions in technology companies since 1975. From 1971 to 1990, he held various engineering and management positions at Westinghouse Bellambie, South Africa. After that company was taken over by Murray & Roberts, a major South African corporation, it diversified and grew into a group of electronic companies, including Honeywell South Africa. During his last five years in South Africa, he was Group Managing Director of the holding company.
From 1965 to 1970, he worked for Tauernkraftwerke AG Salzburg, in an engineering function. He acquired an electrical engineering qualification from the College of Higher Technical Education, Salzburg.
He also holds an executive position in Biomay AG, an Austrian biotechnology company.
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Elmar received his Physics Diploma 1995 and his PhD 1999 from Vienna University of Technology. His academic studies involved investigations of the stoichiometry and nano-structure of metal-alloys, and were based on the optimization of surface science analytical tools. During his studies the interaction of charged particles with surfaces and related nano-scale phenomena were particularly investigated.
He joined IMS in 1999 and has been involved in system engineering in the fields of mask less lithography and direct nanopatterning. Elmar co-authored more than 20 patents relevant for the eMET, PML2 and CHARPAN technologies.
In October 2005 he became COO of IMS Nanofabrication.
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Karin received her degree in Commerce with specialization in management, controlling and consulting from the Vienna University of Economics and Business Administration in 2004.
In 2003 she spent a summer term at the ESADE in Barcelona, where she participated in the CEMS master program. Beside her studies she did various internships and projects in Austria and London with focus on financial issues and worked part time in the seminar organization at the Austrian Controller Institute.
Since June 2004 she is member of IMS with focus on venture capital issues and other business related activities.
In November 2005 she became CFO of IMS Nanofabrication.
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| Hans Loeschner, CTO
Hans studied physics at the University of Vienna and from 1967 to 1971 was employed by Philips Research Laboratories in Eindhoven, Netherlands. After completing his studies, he worked at Sacher Technik Vienna on ion beam resistless chip fabrication (1976-1983). In 1984/1985 he was cofounder of IMS - Ionen Mikrofabrikations Systeme GmbH, in 2001 of IMS Nanofabrication GmbH,, and in 2006 of IMS Nanofabrication AG. focusing on projection maskless nanolithography and nanopatterning. He also strongly contributed to several patents. Since October 2005 he is CTO concentrating on technical marketing and project administration. Hans is program committee member of the EIPBN, EMLC, MNE, and SPIE Advanced Lithography – Alternative Lithographic Technologies conferences. |
Copyright by IMS Nanofabrication AG, Vienna, Austria, Last update: 27 April 2010